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Dry Film Photoresist for Chemical Milling
Negative-Working Alkaline Developable Thick DFR for Chemical Milling

Excellent Adhesion to Metal Substrate

MS9xxx Series has Excellent Adhesion to Metal Substrates(e.g. SUS, Copper).
Also the DFR has Excellent Resistance Against Chemical Etchant.

Excellent Resist-Stripping Performance

In Stripping Process, MS9xxx is Crumbled to Small Fragments, and Fragments are Soluble in Sodium Hydroxide Stripper.
Because of these Features, Using MS9xxx Decreases Troubles that are Caused by Stripped DFR and Improves Manufacturing Yield.

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Specification

 
Type Resist Thickness
MS9050 50µm
MS9025 25µm
Photoresist
Dry Film Photoresist for Chemical MillingDry Film Photoresist for SandblastDry Film Photoresist with Excellent Resistance
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