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New Solder Resist Formation System (SR-ReFiP)
Multi-Stepped Structure of Solder Resist is Easily Achieved.
SR can be Thinned with MPM Unique Wet Process (SR ReFiP)

Applications

Cross-sectional SEM photograph
  • Flattened Solder Resist
  • Dam Formation for Underfill resin
  • Self-Aligned Electrode Pad (Exposure of Electrode Surface in Flip Chip Mounting)
  • Any other Multi-Stepped Structure

Thinning Uniformity

Processing
Time
-Thickness
Max.
[µm]
Min.
[µm]
Ave.
[µm]
STDEV.
[µm]
Rate
[µm/sec]
10sec 13.9 12.6 13.1 0.37 1.31
15sec 18.0 16.5 17.4 0.36 1.16
20sec 21.2 20.1 20.7 0.33 1.04
25sec 23.3 22.3 22.8 0.30 0.91

Panel Size : W510mm×L410mm
Measurement : 20points

  • Excellent Uniformity
  • High Productivity

ReFiP Processor

ReFiP Processor

Necessity and Advantage of SR-ReFiP

All Clear!!
 
Structure Cu Pad
Poor
Adhesion
Ni/Pd/Au
Plating
Short
Solder
Bridge
Under Fill
Resin
Void
Solder
Resist
Undercut
Conventional Trench X X X X circle
iSRO triangle doublecircle triangle X X
SR-ReFiP Trench doublecircle circle circle doublecircle doublecircle
iSRO doublecircle doublecircle doublecircle doublecircle doublecircle
ETS doublecircle circle triangle doublecircle doublecircle
Photoresist system, other
Resist System for Fine Pattern Circuit FormationNew Solder Resist Formation System
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