HOME > Electronic materials > Photoresist > New Dry Film Photoresist with Excellent Chemical Resistance
- Excellent Chemical Resistance
- Excellent Resistance to Hydrofluoric Acid and Mixture of HF Nitric Acid
- Excellent Resistance to Alkali Etchant
- Considerations for Etching Glass, Difficulty Etching Metal
- Resist-Stripping is Available
Example of Usage
Resist Resolution
| Exposure | Hole Opening | Line & Space |
|---|---|---|
| 200 mJ／cm2 | 50µmφ | 40µm L/S |
| 300 mJ／cm2 | 60µmφ | 50µm L/S |
| 400 mJ／cm2 | 80µmφ | 80µm L/S |
Specification
| Type | Resist Thickness |
|---|---|
| KN30 | 30µm |
