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To Provide Characteristic Photosensitive Resist that is Applicable to Various Substrates.
Product Line-up
Dry Film Photoresist for Chemical Milling
Negative-Working Alkaline Developable Thick DFR for Chemical Milling.
Dry Film Photoresist for Sandblast
Negative-Working Alkaline Developable Thick DFR for Sandblast Process.
New Dry Film Photoresist with Excellent Chemical Resistance
KN30 has Excellent Resistance to Strongly Damaging Chemicals.