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Dry Film Photoresist for Sandblast
Negative-Working Alkaline Developable Thick DFR for Sandblast Process
  • Excellent Resist Performance
  • High Resolution
  • Easy to Peel off the Carrier Film at R.T.
  • Silicone Free (except MS8000series)
  • Color Image Formation after Exposure
Products Photo
Sample Image

Specification

 
Type Resist Thickness Method
MS7100 100µm Direct Method
MS7050 50µm Direct Method
MS8100 100µm Indirect Method
MS8050 50µm Indirect Method
 
Type Use Application
IND-ADH Adheisive for MS8000 series
Photoresist
Dry Film Photoresist for Chemical MillingDry Film Photoresist for SandblastDry Film Photoresist with Excellent Resistance
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